
Semitool Sirius HydrOzone System consisting of:
- Model: Sirius
- Process: DI water/ozone
- Rinse: DI water with ammonium hydroxide
- Dry: N2
- Uses a minimal amount of deionized water and ozone
- Low cost, low environmental impact process used for photoresist stripping, photolithography rework and organic cleans
- Does not require the use of sulfuric acid with its related delivery and disposal costs.
- Manually loaded semi-automated system with a 50 wafer capacity spray processing chamber.
- Can accommodate both 200mm and 300mm wafer sizes.
- Power: 208 VAC, 3 Phase, 5 wire, 60 Hz, 45 A
- Vintage: 2003
- Operator Manual and Documentation
- Full refurbishment to original Semitool Sirius specifications
2003
Excellent condition
8-10 weeks