Aixtron 2400 MOCVD Reactor System

AIXTRON 2400 G2 MOCVD REACTOR SYSTEM consisting of:

- Model: 2400 G2 MOCVD Reactor System
- Configured for 4"/100mm Wafers
- 9 MO Source Positions
- Closed Coupled Showerhead
- Temperature Controlled and Cooled Showerhead Injector
- Cold Walled Vertical Chamber w/ Quartz Liner
- Use of Multiple Gas Plenums
- Homogenius Mixing of Reagents Very Close to the Substrate
- Wafer Rotation - 3 Zone Independent Concentric Tungsten Heater
- Use of Optical Pyrometer to Establish Precise Temperature Uniformity (2 - 5 deg. C)
- Temperature Uniformity Maintained at all Growth Temperatures (500 - 1200 deg. C)
- Glovebox and Loadlock Operation, Nitrogen Atmosphere Consistently Maintained
- Quantity of Six (6) Systems are Available
- Systems are Currently Installed and can be Inspected

5 Systems with 5 Hydride Lines:
- 2 Arsine
- 2 Disilane
- 1 Phosphine

1 System with 4 Hydride Lines:
- 2 Arsine
- 1 Disilane
- 1 Phosphine

Systems are Currently Installed and can be Inspected.
Systems are being sold in AS-IS Condition.

2-4 weeks