KLA-Tencor UV-1080

KLA-TENCOR UV-1080 THIN FILM MEASUREMENT SYSTEM consisting of:

- Model: Prometrix UV-1080
- Max wafer capable: 200mm
- Intel Pentium III Computer
- Windows NT
- Summit 2.63.06
- 2 Open Cassette Stations
- Equipe PRI Pre-Aligner (Auto-Find Notch Flat)
- Pattern Recognition Type: Cognex 5400
- GENS/SECS II
- RS-232 to Ethernet Adapter
- Options Included:
- Reference Chip N2 Purge Upgrade
- Status Lamp (RYGB)
- Symbol F2 Barcode Scanner
- Fully Refurbished to Manufacturer's Specifications

KLA UV-1080 MEASUREMENT CAPABILITIES:

Thickness Range:
- Oxide: <20 Å to 25 μm
- Nitrides/Oxynitrides: <40 Å to 25 μm
- Photoresists/Polyimides: <500 Å to 15 μm
- Poly on Oxide: 200 Å to 2 μm Poly on 80 Å to 4000 Å Oxide
- Poly on Nitride: 200 Å to 2 μm Poly on 80 Å to 4000 Å Nitride
- Amorphous Silicon: 200 Å to > 1 μm Amorphous Si on 80 Å to 4000 Å Oxide or Nitride
- Oxide on Poly: <100 Å to 1 μm Oxide on >500 Å Poly
- Oxide on Aluminum: <1000 Å to 25 μm
- Oxide on Tungsten: <1000 Å to 25 μm

Simultaneous MultiLayer (Measures over 500 discrete wavelengths):

- Transparent on Transparent: Total Thickness of Top 3 Layers > 300 Ã…
- Oxide on Poly: < 100 Ã… to 1.0 um Oxide on > 500 Ã… Poly
KLA UV-1080 ABSOLUTE ACCURACY:
Thickness:
- 125 Å to 250 Å ±2.5 Å of NIST Certified Range
- 250 Å to 1.0 um ±1% of NIST Certified Range

1998

Excellent Condition Guaranteed.

Fully Reconditioned to Factory Specifications.

6 Month Warranty and Full Specification Guarantee.

30 Day Right of Return.

8-10 weeks