
Oxford Plasmalab 80 Plus RIE consisting of:
- Model: Plasmalab 80 Plus RIE
- Setup to etch Dielectrics, Polymers, and Descum
- Non-Load Locked Reactive Ion Etcher
- Up to 8"/200mm Wafer Capable
- Advanced Energy RFX-600A RF Power Supply
- RF Generator, 600 Watt 13.56 MhZ
- Brand New HP Computer
- Brand New 17" LCD Monitor (with articulating arm)
- Oxford PC2000 Software (latest version)
- Windows Vista Operating System
- Gas configuration: CHF3, Ar, and O2
- CHF3 is mainly used to etch dielectrics ( Silicon Dioxide, and Silicon Nitride)
- 3 MFCs installed (total of 6 MFCs can be installed)
- MKS Model 1179A MFC's
#1 Gas: CHF3, Range: 100 SCCM
#2 Gas: 02, Range: 50 SCCM
#3 Gas: AR, Range: 100 SCCM
- Serial Number: 219683
- Manufactured in 2000
- Voltage: 208V, 3PH, 25A, 60Hz
- Thermo Electron Temperature Controller
- Alcatel ADP 122-P Vacuum Pump
- Operations Manual for Oxford Plasmalab 80 RIE.
- Refurbished to meet all original OEM specifications!
ClassOne Support of Oxford RIE Etchers:
2000
Excellent Condition Guaranteed.
Fully Reconditioned to Factory Specifications by ClassOne.
6 Month Warranty and Full Specification Guarantee.
30 Day Right of Return.
10-12 weeks