ProTemp 4-Tube Furnace

PROTEMP SOLAREACTOR PRO-200, 4-STACK MULTI-PROCESS FURNACE SYSTEM consisting of:

- Up to 8"/200mm Wafers
- Computer Controlled
- Data Collection and Recipe Management
- Gas Cabinet
- Elevator for Wafer Handling and Boat Insertion
- Manuals & Software
- Installed New in 2009 and only Oxidation and Anneal Tubes were Briefly Used
- Installed and Available for Inspection

Set Up For:

- Plasma SiNx Deposition (Never Used)
- Oxidation
- Anneal
- POCl3 (N-type) Doping (Never Used)

Detailed Configuration as Follows:

Tube Level 1: Plasma SiNx Deposition
- PECVD SiNx deposition using an efficient wafer boat, with shadowless wafer seating features. These films are commonly used as antireflective coatings in solar cells, dielectric masking films in semiconductor devices, etc.
- Plumbed for N2, SiH4 and NH3
- BKM SiNx deposition recipe included with system
- Quartz reactor tube and liner
- Extensive safety interlocks for safe operation, with N2 purge capabilities for all toxic/corrosive gas lines
- Flexible wafer size allowance, up to 8"/156mm

Tube Level 2: Oxidation
- Tube level has been used to grow high-quality SiO2 films
- Tube level is plumbed with O2, N2, as well as an onboard steam generator for high oxidation rates
- Temperature range from 400 - 1000C
- Flexible wafer size allowance, up to 8"/156mm

Tube Level 3: Anneal
- Tube level has been used as an anneal system, with temperature range 400 - 1000C
- Tube level is plumbed with N2
- Flexible wafer size allowance, up to 8"/156mm

Tube Level 4: POCl3 (N-type) Si doping
- System is plumbed for N2, O2 and N2 liquid source carrier gas
- System is equipped with a liquid POCl3 delivery system, with effluent gases exited through the rear of the tube
- BKM N-type multi-step doping recipe included with system
- Flexible wafer size allowance, up to 8"/156mm

2009

This System is being Sold in AS IS Condition Only.

6-8 weeks