Etching Systems

Process Equipment

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Etching Systems

Etching Systems

Browse our complete inventory below or click here to learn why you should choose ClassOne for high quality Etching Systems equipment.

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Manufacturer

Model

Configuration

Plasmalab 80 Plus RIE

Non-load locked RIE, 240mm electrode, Windows XP, 2005 vintage, like-new condition!

Plasmalab 80 Plus RIE

Setup for Dielectris, Polymer Etching, 600W RF Generator, new computer, latest software installed!

Plasmatherm

790 Dual Chamber PECVD

2 PECVD chambers, Twin 240mm Plates

Plasmatherm

790 PECVD System

PECVD Chamber, up to 150mm wafer capable, Non-Load Locked Chamber

Plasmatherm

8"/200mm wafers max, single load-locked chamber, 11" Electrode, Chlorine Chemistry

STS

Multiplex ICP ASE Etcher

Deep Silicon Etch, Bosch Process, Electrostatic Wafer Clamp Electrode, He Backside Cooling,

STS

Pegasus ASE VPX Etcher

150mm or 200mm capable, Deep Silicon Etching, 25um/min Etching Rate

600 Plasma Asher

150mm wafer capable, 245mm diameter chamber, 600W RF power generator

Yield Engineering

YES-R3 Plasma Asher

Down Stream Plasma Asher, 12"x12" Sample Shelves (2)