Plasma Etchers & PECVD

Process Equipment

Plasma Etchers & PECVD

Image

Manufacturer

Model

Configuration

Max Wafer

PX-500 Plasma Asher

Downstream or Direct Plasma, 13.56 MHz, 600 W RF Power, Microprocessor Controlled, Vacuum Pump Included

Plasmalab 80 Plus RIE

8" Wafer Capable, single chamber RIE, non-load locked chamber

Plasmatherm

150mm Wafer Capable, Non Load-Locked Chamber

Plasmatherm

8"/200mm Wafers, Dual Chamber, Load Locked, PECVD

SPTS

8"/200mm max, currently setup for 6"/150mm wafers, Helium Backside Cooling, Mechanical Wafer Clamping

SPTS

MPX ICP PRO SR ETCHER

SiC, III-V, or Metal Etch, Single Chamber, Load-Locked, 2011 Vintage, Like-New!

SPTS

MPX ICP PRO SR ETCHER

Setup for SiC, III-V, or Metal Etch, Single Chamber, Load-Locked, 2011 Vintage, Like-New!

SPTS

MPX ICP SR Etcher

Single Chamber, Load-Locked, 2007 Vintage

SPTS

Multiplex ICP SR Etcher

Single Chamber, Load-Locked

SPTS

200mm Wafers, Single Chamber PECVD, 2008 Vintage!