Film Thickness Measurement

Metrology Equipment

Film Thickness Measurement

Image

Manufacturer

Model

Configuration

Max Wafer

150mm-200mm Wafers, Measures Film Thickness, 2 Open Cassette Stations

150mm-200mm Wafers, Measures Film Thickness, 2 Open Cassette Stations

150mm-200mm Wafers, Measures Film Thickness, 2 Open Cassette Stations

150mm-200mm Wafers, Measures Film Thickness, 2 Open Cassette Stations

150mm-200mm Wafers, Measures Film Thickness, Refractive Index and Extinction Coefficient

Nanometrics

Processes up to 8"/200mm Wafers

Nanometrics

Film Thickness Measurement System, 200mm Capable, Wafer Mapping Capability

Nanometrics

200mm Wafer Capable, Autofocus, Wafer Mapping Capability

Nanometrics

200mm and 300mm Wafer Capable, Automatic Thin Film Analysis via Spectroscopic Ellipsometry

SD-4000 Ellipsometer

8"/200mm Wafer Capable, Automated Ellipsometer, 3 Lasers

GES-5 Ellipsometer

Spectroscopic Ellipsometer, 12" Vacuum Chuck, Variable Angle, 210nm to 900nm Spectral Range