Browse by Category

• Process Equipment
  • Wet Benches
  • Mask Aligners
  • Spin Rinse Dryers
  • Photoresist Coating
  • Polishing Systems
  • Deposition Systems
  • Dicing Systems
  • Etching Systems
  • Other Process
• Metrology Equipment
  • Thin Film Measurement
  • Surface Metrology
  • Defect Inspection
  • Scanning Microscopes
  • Inspection Microscopes
  • Stereozoom Microscopes
  • Probe Stations
• Other Equipment
  • Assembly Equipment
  • Facilities Support
  • Test Equipment
• New Arrivals

Home ›  Process Equipment › Etching Systems

Etching Systems

	Manufacturer	Model	Configuration	Price
	Branson	3100 Plasma Barrel Asher	12"" x 21"" x 12"" Quartz Barrel, Vacuum Pump	CALL
	Branson	S3100 Barrel Asher	Automatic, one channel, plasma barrel etcher, 1 process gas input, 6""/150 wafer capable	CALL
	LAM	490 Etching System	1250W RF Generator, Programmable, 3 - 6"" wafers	CALL
	March	AP-1000 Plasma System	PLC Controller, 13.56 MHz Power Supply, 600 Watt RF Generator with Variable Automatic Tuning, CE Marked	CALL
	Mattson	Aspen II Strip System	Mattson Aspen II Strip System	CALL
	Oxford	Plasmalab 80 Plus RIE System	13.56mhz RF Generator, Alcatel ATP 400 HPC Turbo Pump, Vacuum Pump, chiller	CALL
	Oxford	Plasmalab 80 Plus RIE System	600W RF Generator, Alcatel Turbo Pump, new computer, new gas box, latest software installed!	CALL
	Tegal	803 Plasma Etcher	Automatic Plasma Etcher, 4"" wafer capable, Leybold D40BCS Vacuum Pump	CALL
	Tepla	300 AL PC Plasma Asher	200mm capable, Quartz Chamber, 2 Process Gas Inputs plus N2 Input, PC controlled	CALL
	Tepla	300 AL PC Plasma Asher	200mm capable, Quartz Chamber, 2 Process Gas Inputs plus N2 Input, PC controlled	CALL