KLA-Tencor UV-1280SE Thin Film Measurement System
OEM Part #:
Prometrix UV-1280SE Thin Film Measurement System
OEM Name:
KLA-Tencor
ID #:
5096
Product Details:
KLA-TENCOR UV-1280SE THIN FILM MEASUREMENT SYSTEM consisting of:
- Model: Prometrix UV-1280SE - Configured for 100mm and 150mm handling - Measures Film Thickness, Refractive Index (RI) and Extinction Coefficient of Single and Multi-Layer Thin Film Stacks Simultaneously without Referencing - Reflectivity Range of 220 nm to 800 nm - Intel Pentium Computer - Operations Manuals Included - Fully Refurbished to Excellent Condition
MEASUREMENT CAPABILITIES:
Single Layer Thickness (t): - Thermal Oxide: 0 Å to 40 µm - Oxynitride: 0 Å to 30 µm - Nitride: 0 Å to 25 µm - BPSG: 0 Å to 40 µm - Photoresist: 0 Å to 40 µm - Polyimide: 0 Å to 40 µm - Poly on Oxide: 50 Å to 2 µm Poly on 40 Å to 4000 Å Oxide - Poly on Nitride: 50 Å to 2 µm Poly on 40 Å to 4000 Å Nitride - Amorphous Silicon: 50 Å to 2 µm Amorphous on 40 Å to 4000 Å Oxide or Nitride - Oxide on Poly: 50 Å to 1 µm Oxide on <500 Å Poly - Nitride on Poly: 50 Å to 1 µm Nitride on <500 Å Poly - TiN: 80 Å to 500 Å - Oxide on Aluminum: <1000 Å to 25 µm - Oxide on Tungsten: <1000 Å to 25 µm Single Layer Refractive Index (N, k): - Thermal Oxide: <100 Å - Oxynitride: <100 Å - Nitride: <100 Å - BPSG: <500 Å - Poly on Oxide: <100 Å - Amorphous Silicon: <100 Å - TiN: <200 Å Simultaneous MultiLayer and Simultaneous MultiVariable Measurements: - Up to 7 Unknowns in up to an 8 Layer Stac ABSOLUTE ACCURACY: Thickness:
±1.5 Å of NIST Certified Range for Oxide <125 Å: ±1 Å of NIST Certified Range for Oxide 125 Å to 300 Å ±1% of NIST Certified Range for Oxide 300 Å to 1.0 µm Index:
±0.025 for >350 Å to 1.0 µm Oxide ±0.025 for >250 Å to 1.0 µm Nitride
STABILITY (3 SIGMA OF MEANS):
Oxide and Nitride Thickness:
- 20-100 Å 3 sigma <0.48 Å - 100-300 Å 3 sigma <0.9 Å - 200-2000 Å 3 sigma <0.3 Å - 2000 Å-1.0 µm 3 sigma <0.1% (Two Parameter Measurements)
- Model: Prometrix UV-1280SE - Configured for 100mm and 150mm handling - Measures Film Thickness, Refractive Index (RI) and Extinction Coefficient of Single and Multi-Layer Thin Film Stacks Simultaneously without Referencing - Reflectivity Range of 220 nm to 800 nm - Intel Pentium Computer - Operations Manuals Included - Fully Refurbished to Excellent Condition
MEASUREMENT CAPABILITIES:
Single Layer Thickness (t): - Thermal Oxide: 0 Å to 40 µm - Oxynitride: 0 Å to 30 µm - Nitride: 0 Å to 25 µm - BPSG: 0 Å to 40 µm - Photoresist: 0 Å to 40 µm - Polyimide: 0 Å to 40 µm - Poly on Oxide: 50 Å to 2 µm Poly on 40 Å to 4000 Å Oxide - Poly on Nitride: 50 Å to 2 µm Poly on 40 Å to 4000 Å Nitride - Amorphous Silicon: 50 Å to 2 µm Amorphous on 40 Å to 4000 Å Oxide or Nitride - Oxide on Poly: 50 Å to 1 µm Oxide on <500 Å Poly - Nitride on Poly: 50 Å to 1 µm Nitride on <500 Å Poly - TiN: 80 Å to 500 Å - Oxide on Aluminum: <1000 Å to 25 µm - Oxide on Tungsten: <1000 Å to 25 µm Single Layer Refractive Index (N, k): - Thermal Oxide: <100 Å - Oxynitride: <100 Å - Nitride: <100 Å - BPSG: <500 Å - Poly on Oxide: <100 Å - Amorphous Silicon: <100 Å - TiN: <200 Å Simultaneous MultiLayer and Simultaneous MultiVariable Measurements: - Up to 7 Unknowns in up to an 8 Layer Stac ABSOLUTE ACCURACY: Thickness:
±1.5 Å of NIST Certified Range for Oxide <125 Å: ±1 Å of NIST Certified Range for Oxide 125 Å to 300 Å ±1% of NIST Certified Range for Oxide 300 Å to 1.0 µm Index:
±0.025 for >350 Å to 1.0 µm Oxide ±0.025 for >250 Å to 1.0 µm Nitride
STABILITY (3 SIGMA OF MEANS):
Oxide and Nitride Thickness:
- 20-100 Å 3 sigma <0.48 Å - 100-300 Å 3 sigma <0.9 Å - 200-2000 Å 3 sigma <0.3 Å - 2000 Å-1.0 µm 3 sigma <0.1% (Two Parameter Measurements)
Condition:
Refurbished
Condition:
Excellent Condition Guaranteed.
Fully Refurbished to Factory Specifications by ClassOne.
6 Month Warranty and Full Specifications Guarantee.
30 Day Right of Return.
Description:
KLA-Tencor UV-1280SE Thin Film Measurement System.
