KLA-Tencor Prometrix UV-1280SE Thin Film Measurement System

KLA-TENCOR UV-1280SE THIN FILM MEASUREMENT SYSTEM consisting
of:
- Model: Prometrix UV-1280SE configured for 200mm Wafer Handling
- This price does not include applications (recipe and matching) support
- Measures Film Thickness, Refractive Index (RI) and Extinction Coefficient of
Single and Multi-Layer Thin Film Stacks Simultaneously without Referencing
- Reflectivity Range of 220 nm to 800 nm
- Intel Pentium Computer
- Operations Manuals Included
- Fully Refurbished to excellent condition

MEASUREMENT CAPABILITIES:
Single Layer Thickness (t):
- Thermal Oxide: 0 Å to 40 µm
- Oxynitride: 0 Å to 30 µm
- Nitride: 0 Å to 25 µm
- BPSG: 0 Å to 40 µm
- Photoresist: 0 Å to 40 µm
- Polyimide: 0 Å to 40 µm
- Poly on Oxide: 50 Å to 2 µm Poly on 40 Å to 4000 Å Oxide
- Poly on Nitride: 50 Å to 2 µm Poly on 40 Å to 4000 Å Nitride
- Amorphous Silicon: 50 Å to 2 µm Amorphous on 40 Å to 4000 Å Oxide or
Nitride
- Oxide on Poly: 50 Å to 1 µm Oxide on <500 Å Poly
- Nitride on Poly: 50 Å to 1 µm Nitride on <500 Å Poly
- TiN: 80 Å to 500 Å
- Oxide on Aluminum: <1000 Å to 25 µm
- Oxide on Tungsten: <1000 Å to 25 µm
Single Layer Refractive Index (N, k):
- Thermal Oxide: <100 Å
- Oxynitride: <100 Å
- Nitride: <100 Å
- BPSG: <500 Å
- Poly on Oxide: <100 Å
- Amorphous Silicon: <100 Å
- TiN: <200 Å

Simultaneous MultiLayer and Simultaneous MultiVariable Measurements:
- Up to 7 Unknowns in up to an 8 Layer Stac
ABSOLUTE ACCURACY:
Thickness:
±1.5 Å of NIST Certified Range for Oxide <125 Å:
±1 Å of NIST Certified Range for Oxide 125 Å to 300 Å
±1% of NIST Certified Range for Oxide
300 Å to 1.0 µm
Index:
±0.025 for >350 Å to 1.0 µm Oxide
±0.025 for >250 Å to 1.0 µm Nitride
STABILITY (3 SIGMA OF MEANS):
Oxide and Nitride Thickness:
- 20-100 Å 3 sigma <0.48 Å
- 100-300 Å 3 sigma <0.9 Å
- 200-2000 Å 3 sigma <0.3 Å
- 2000 Å-1.0 µm 3 sigma <0.1%
(Two Parameter Measurements)